Antibiotic residues in wastewater have become a global concern due to their potential consequences. Advanced oxidation processes have proven to be an effective solution for removing these contaminants. In our study, we successfully fabricated FTO|WO3|ZnO heterojunction films/electrodes using hydrothermal and drop-casting methods. These films effectively degrade the antibiotic moxifloxacin hydrochloride (MOX, 1 10-5 mol L-1) in deionized water and wastewater from a site located in Teresina, Piauí, Brazil, using polychromatic irradiation. The structural characteristics of the films were analyzed through X-ray diffraction (XRD), while the morphology was examined using scanning electron microscopy (SEM). The XRD patterns confirmed the formation of the FTO|WO3|ZnO heterojunction, displaying characteristic peaks of the monoclinic WO3 and hexagonal ZnO phases. The SEM images of the cross-section of the FTO|WO3|ZnO heterojunction film revealed a thickness of 8.314 μm. It confirmed the formation of the heterojunction, where ZnO particles cover plate-shaped WO3 particles. The photoelectrochemical characterization data indicated that the FTO|WO3|ZnO heterojunction film exhibited a superior photoelectrochemical response compared to its pristine counterparts and the inverted FTO|ZnO|WO3 heterojunction film. Additionally, the FTO|WO3|ZnO film displayed a longer charge carrier recombination time of approximately 94.7 s, greater than that observed for the FTO|WO3 film. Importantly, charge carrier transport via the type II mechanism was crucial for the excellent photoelectrochemical performance achieved by this film. Furthermore, the tests for the degradation of MOX showed that when polarization conditions were applied (using the EHP configuration with an applied potential of 0.7 V vs. Ag/AgCl), the films demonstrated a higher efficiency in degrading MOX, which was present in deionized water, compared to tests conducted without polarization (HP configuration). The FTO|WO3|ZnO heterojunction film achieved a degradation efficiency of 48% for MOX in deionized water and 29.4% in wastewater under the EHP configuration. These findings further confirm that the FTO|WO3|ZnO film is effective in photoelectrochemically degrading the antibiotic MOX in real wastewater treatment systems, highlighting its potential for environmental remediation applications.